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Journal Articles Thin Solid Films Year : 2008

Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate

P. Leempoel
  • Function : Author
P. Descamps
  • Function : Author
T. Kervyn de Meerendré
  • Function : Author
J. Charliac
Pere Roca I Cabarrocas
P. Bulkin
  • Function : Author
D. Daineka
  • Function : Author
T.H. Dao
  • Function : Author
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Dates and versions

hal-00350890 , version 1 (07-01-2009)

Identifiers

  • HAL Id : hal-00350890 , version 1

Cite

P. Leempoel, P. Descamps, T. Kervyn de Meerendré, J. Charliac, Pere Roca I Cabarrocas, et al.. Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate. Thin Solid Films, 2008, 516, pp.6853. ⟨hal-00350890⟩
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