Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution - CentraleSupélec Access content directly
Journal Articles Journal of Non-Crystalline Solids Year : 2004

Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution

No file

Dates and versions

hal-00321015 , version 1 (12-09-2008)

Identifiers

  • HAL Id : hal-00321015 , version 1

Cite

P. Chaudhuri, D. Das, P.P. Ray, Namita Dutta Gupta, Dhananjoy Roy, et al.. Correlation between plasma chemistry, microstructure and electronic properties of Si:H thin films prepared by hydrogen dilution. Journal of Non-Crystalline Solids, 2004, 338-340, pp.236. ⟨hal-00321015⟩
19 View
0 Download

Share

Gmail Facebook X LinkedIn More