Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures - CentraleSupélec Access content directly
Conference Papers Year : 2005

Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures

P. Chaudhuri
  • Function : Author
A. Bhaduri
  • Function : Author
S. Vignoli
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Dates and versions

hal-00321707 , version 1 (15-09-2008)

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  • HAL Id : hal-00321707 , version 1

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Namita Dutta Gupta, Christophe Longeaud, P. Chaudhuri, A. Bhaduri, S. Vignoli. Some Properties of amorphous carbon films deposited on the grounded electrode of a RF-PECVD reactor from Ar-CH4 mixtures. 21st International Conference on Amorphous and Nanocrystalline Semiconductors, 2005, Portugal. ⟨hal-00321707⟩
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