Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate - CentraleSupélec Access content directly
Conference Papers Year : 2007

Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate

P. Leempoel
  • Function : Author
P. Descamps
  • Function : Author
T. Kervyn de Meerenedre
  • Function : Author
J. Charliac
Pere Roca I Cabarrocas
P. Bulkin
  • Function : Author
D. Daineka
  • Function : Author
T.H. Dao
  • Function : Author
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Dates and versions

hal-00322305 , version 1 (17-09-2008)

Identifiers

  • HAL Id : hal-00322305 , version 1

Cite

P. Leempoel, P. Descamps, T. Kervyn de Meerenedre, J. Charliac, Pere Roca I Cabarrocas, et al.. Distributed Electron Cyclotron Resonance plasma: a technology for large area deposition of device quality a-Si:H at very high rate. E-MRS 2007 Spring Meeting, 2007, France. ⟨hal-00322305⟩
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