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Journal Articles Journal of Non-Crystalline Solids Year : 2008

High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method

P. Chaudhuri
  • Function : Author
A. Bhaduri
  • Function : Author
A. Bandyopadhyay
  • Function : Author
S. Vignoli
P.P. Ray
  • Function : Author
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Dates and versions

hal-00350868 , version 1 (07-01-2009)

Identifiers

  • HAL Id : hal-00350868 , version 1

Cite

P. Chaudhuri, A. Bhaduri, A. Bandyopadhyay, S. Vignoli, P.P. Ray, et al.. High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method. Journal of Non-Crystalline Solids, 2008, 354, pp.2105. ⟨hal-00350868⟩
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