Optimized GaAs High Contrast Grating Design and Fabrication for Mid-infrared Application at 2.3 μm - CentraleSupélec Access content directly
Conference Papers Year : 2011

Optimized GaAs High Contrast Grating Design and Fabrication for Mid-infrared Application at 2.3 μm

Abstract

A GaAs high contrast grating design has been optimized for a mid-infrared VCSEL application through the use of an optimization algorithm. Reflection spectra of an experimental grating with dimensions within the computed tolerances are in a correct agreement with the simulations.
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Dates and versions

hal-00642181 , version 1 (17-11-2011)

Identifiers

  • HAL Id : hal-00642181 , version 1

Cite

Christyves Chevallier, Nicolas Fressengeas, Frédéric Genty, Joel Jacquet, Youness Laaroussi, et al.. Optimized GaAs High Contrast Grating Design and Fabrication for Mid-infrared Application at 2.3 μm. Frontiers in Optics 2011, Oct 2011, San Jose, United States. pp.CD-ROM Proceedings. ⟨hal-00642181⟩
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