Growth and transport properties of HT-LixCoO2 thin films deposited by pulsed laser deposition
Abstract
The successful in situ growth of single phase, c-axis oriented, layered structured LixCoO2 thin films on (0 0 0 1) Al2O3 substrates by pulsed laser deposition is reported. Thin films were grown in an oxygen pressure of 1 mbar and substrate temperatures varying from 300 up to 600 °C. It is found that the surface roughness and electrical resistance of the films depends strongly on the deposition temperatures.