Study of a-C:H films deposited from methane-argon mixture on the grounded and rf powered electrodes of a rf-PECVD Unit - CentraleSupélec Access content directly
Conference Papers Year : 2005

Study of a-C:H films deposited from methane-argon mixture on the grounded and rf powered electrodes of a rf-PECVD Unit

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hal-00321566 , version 1 (15-09-2008)

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  • HAL Id : hal-00321566 , version 1

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Namita Dutta Gupta, Christophe Longeaud, A. Bhaduri, P. Chaudhuri. Study of a-C:H films deposited from methane-argon mixture on the grounded and rf powered electrodes of a rf-PECVD Unit. 13th International Workshop on the Physics of Semiconductor Devices, 2005, India. ⟨hal-00321566⟩
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