Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance - CentraleSupélec Access content directly
Conference Papers Year : 2006

Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance

T.H. Dao
  • Function : Author
D. Daineka
  • Function : Author
P. Bulkin
  • Function : Author
Pere Roca I Cabarrocas
T. Kervyn de Meerenedre
  • Function : Author
P. Descamps
  • Function : Author
P. Loempoel
  • Function : Author
No file

Dates and versions

hal-00321911 , version 1 (16-09-2008)

Identifiers

  • HAL Id : hal-00321911 , version 1

Cite

T.H. Dao, Marie-Estelle Gueunier-Farret, D. Daineka, P. Bulkin, Pere Roca I Cabarrocas, et al.. Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance. E-MRS 2006 Spring Meeting, 2006, France. ⟨hal-00321911⟩
36 View
0 Download

Share

Gmail Facebook X LinkedIn More