Atomic layer deposition of gallium phosphide for silicon based photovoltaics - CentraleSupélec Access content directly
Conference Papers Year : 2016
No file

Dates and versions

hal-01363690 , version 1 (11-09-2016)

Identifiers

  • HAL Id : hal-01363690 , version 1

Cite

A.S. Gudovskikh, I.A. Morozov, D. A. Kudryashov, E.V. Nikitina, A. S. Bukatin, et al.. Atomic layer deposition of gallium phosphide for silicon based photovoltaics. Photovoltaic Technical Conference, PVTC 2016, May 2016, Marseille, France. ⟨hal-01363690⟩
89 View
0 Download

Share

Gmail Mastodon Facebook X LinkedIn More